This report studies the Plasma Etch System market. Plasma Etching System is a series of devices and equipment used together to perform plasma etching.
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target.
North America is the largest market with about 51% market share. Japan is follower, accounting for about 20% market share.
The key players are Oxford Instruments, ULVAC, Lam Research, AMEC, PlasmaTherm, SAMCO Inc., Applied Materials, Inc., Sentech, SPTS Technologies (an Orbotech Company), GigaLane, CORIAL, Trion Technology, NAURA, Plasma Etch, Inc., Tokyo Electron Limited etc. Top 3 companies occupied about 18% market share.
The global Plasma Etch System market was valued at US$ 5539.4 million in 2020 and it is expected to reach US$ 12760 million by the end of 2027, growing at a CAGR of 12.5% during 2021-2027.
The research report has incorporated the analysis of different factors that augment the market’s growth. It constitutes trends, restraints, and drivers that transform the market in either a positive or negative manner. This section also provides the scope of different segments and applications that can potentially influence the market in the future. The detailed information is based on current trends and historic milestones. This section also provides an analysis of the volume of production about the global market and about each type from 2016 to 2027. This section mentions the volume of production by region from 2016 to 2027. Pricing analysis is included in the report according to each type from the year 2016 to 2027, manufacturer from 2016 to 2021, region from 2016 to 2021, and global price from 2016 to 2027.
A thorough evaluation of the restrains included in the report portrays the contrast to drivers and gives room for strategic planning. Factors that overshadow the market growth are pivotal as they can be understood to devise different bends for getting hold of the lucrative opportunities that are present in the ever-growing market. Additionally, insights into market expert’s opinions have been taken to understand the market better.
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The research report includes specific segments by region (country), by manufacturers, by Type and by Application. Each type provides information about the production during the forecast period of 2016 to 2027. by Application segment also provides consumption during the forecast period of 2016 to 2027. Understanding the segments helps in identifying the importance of different factors that aid the market growth.
Segment by Type
- Inductively Coupled Plasma (ICP)
- Reactive Ion Etching (RIE)
- Deep Reactive Ion Etching (DRIE)
Segment by Application
- Semiconductor Industry
- Medical Industry
- Electronics & Microelectronics
- Oxford Instruments
- Lam Research
- Samco Inc.
- Applied Materials, Inc.
- Spts Technologies (An Orbotech Company)
- Trion Technology
- Plasma Etch, Inc.
- Tokyo Electron Limited
Production by Region
- North America
Consumption by Region
- North America (United States, Canada)
- Europe (Germany, France, U.K., Italy, Russia)
- Asia-Pacific (China, Japan, South Korea, India, Australia, China Taiwan, Indonesia, Thailand, Malaysia)
- Latin America (Mexico, Brazil, Argentina)
- Middle East & Africa (Turkey, Saudi Arabia, UAE)
Mr. Shirish Gupta
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